# Equipment: MRI: Track 2 Acquisition of an Extreme Ultra Violet (EUV) Resist Flood Exposure Tool

> **NSF 01002526DB NSF RESEARCH & RELATED ACTIVIT** · Johns Hopkins University (MD) · $3,540,000

## Abstract

Modern life depends on powerful computer chips that run everything from smartphones to medical devices. Making these chips requires creating incredibly small features, far tinier than the width of a human hair. To achieve this, the electronics industry now uses a special kind of light called extreme ultraviolet (EUV). This new technology allows the production of smaller, faster, and more efficient chips. However, a major problem is the lack of EUV tools to advance this technology, and they are not easily accessible. This project will install an EUV tool at Johns Hopkins University and make it available as a shared resource for scientists and engineers across the country. The facility will drive innovation in electronics and train the next generation of students to allow them to succeed in fields such as semiconductors, photonics, and quantum technologies, which are areas critical to the nation’s future economy and security.

This project will establish a state-of-the-art facility to advance photoresist research in extreme ultraviolet (EUV) lithography. The project will enable systematic investigations that are not feasible with limited beamline access. The new EUV flood exposure tool combines a reliable discharge plasma source with precise dose control and efficient light delivery, providing stable and reproducible exposures. Integrated in situ diagnostics, including total electron yield measurements, Fourier transform infrared spectroscopy, and mass spectrometry, will allo

## Key facts

- **NSF award ID:** 2511158
- **Awardee organization:** Johns Hopkins University (MD)
- **SAM.gov UEI:** FTMTDMBR29C7
- **PI:** Michael Tsapatsis
- **Primary program:** 01002526DB NSF RESEARCH & RELATED ACTIVIT
- **All programs:** MAJOR RESEARCH INSTRUMENTATION
- **Estimated total:** $3,540,000
- **Funds obligated:** $3,540,000
- **Transaction type:** Standard Grant
- **Period:** 09/01/2025 → 08/31/2028

## Primary source

NSF Award Search: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2511158

## Citation

> US National Science Foundation, Award 2511158, Equipment: MRI: Track 2 Acquisition of an Extreme Ultra Violet (EUV) Resist Flood Exposure Tool. Retrieved via AI Analytics 2026-06-06 from https://api.ai-analytics.org/grant/nsf/2511158. Licensed CC0.

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