This award is made in response to Dear Colleague Letter 24-130, as part of the ECosystem for Leading Innovation in Plasma Science and Engineering (ECLIPSE) interdisciplinary program. This grant supports research that addresses the sustainable use of etch gases in semiconductor manufacturing, which is increasingly important for the US microelectronics industry and associated supply chain, and national prosperity and security. Semiconductor manufacturing of a chip (the “brain” in smart phones) is like building an “entire city on a fingernail”, where each “building” has a specific function, together they make the “city” work. With limited and precious “real estate, the fingernail”, each new version of the “city” gets smaller with taller “skyscrapers” thus achieving improved performance and making the smart phone more and more powerful. The process of manufacturing these chips uses chemical etch gases such as PFAS (per- and polyfluoroalkyl substances) that pose environmental and health concerns. This award supports fundamental research that seeks to provide knowledge to discover and use novel environmentally friendly etch gases and break them down to minimize their emission to the environment. Findings from this research intend to benefit the U.S. economy, environment and society. Research outcomes are integrated into existing curricula on semiconductor manufacturing with new modules focusing on plasma physics and chemistry, plasma-surface interaction, and related chemical proces