Laser based micro- and nano-manufacturing is a key component for the resurgence of American manufacturing. To achieve this goal requires laser manufacturing to have higher processing speed and higher patterning resolution over large areas. A recently discovered phenomenon that has the potential to transform femtosecond laser manufacturing is explored in this research. By overlaying a dielectric substrate with a single atomic layer of graphene, MoS2, or hBN as a sensitizer, a femtosecond pulse can ablate sapphire, glass, or quartz 10-25 times faster. This project seeks to generate fundamental knowledge of this process, determine its applicability and limitations for laser manufacturing, and develop strategies to mitigate these limitations. The knowledge gained from this project will advance the understanding of light-matter interaction in the extreme limit where an atomic-thick hot dense plasma could play a vital role. This new process can have direct impacts on laser manufacturing in high-precision surface texturing with higher throughput. Combined with recent advances in transferring large-area atomic layer materials, this process can enable large scale super-resolution patterning on flat or curved substrates. This project also supports the future workforce in this emerging area of advanced manufacturing through student training. This project will address the following scientific questions: What is the mechanism for such a significant rate enhancement with only one atomic