# SBIR Phase II: Physics-Guided AI Platform for Accelerating Extreme Ultraviolet (EUV) Mask Design

> **NSF 01002526DB NSF RESEARCH & RELATED ACTIVIT** · EXIGENT SOLUTIONS, INC. (TX) · $1,168,940

## Abstract

The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project is to strengthen domestic semiconductor manufacturing capacity at a time of global supply-chain realignment and unprecedented demand for advanced chips. By providing an intelligent software platform that shortens design-to-manufacturing cycles, the project supports faster delivery of high-performance, energy-efficient electronics that underpin cloud computing, artificial intelligence (AI), and critical infrastructure. The approach reduces waste, lowers production costs, and helps keep cutting-edge semiconductor fabrication in the United States, aligning with recent national initiatives to expand on-shore chipmaking and create high-skill jobs. In addition to enabling smaller, more capable devices for consumers and industry, the technology nurtures a new workforce at the intersection of machine learning and semiconductor engineering through internships and workforce trainings. Collectively, these outcomes promote economic growth, technological sovereignty, and increased access to computation resources by maximizing utilization of fabrication assets.

The proposed project tackles the escalating complexity and turnaround delays in extreme ultraviolet (EUV) mask design by advancing a physics-guided AI platform that fuses high-fidelity EUV lithography simulation, process adaptation, and multi-objective layout optimization into a coherent, scalable service. Instead of relying

## Key facts

- **NSF award ID:** 2528393
- **Awardee organization:** EXIGENT SOLUTIONS, INC. (TX)
- **SAM.gov UEI:** P3QCAAJXMFW4
- **PI:** Paul C Lou
- **Primary program:** 01002526DB NSF RESEARCH & RELATED ACTIVIT
- **All programs:** NANOTECHNOLOGY INITIATIVE, MATERIALS SYNTHESIS & PROCESSN
- **Estimated total:** $1,168,940
- **Funds obligated:** $1,168,940
- **Transaction type:** Cooperative Agreement
- **Period:** 09/01/2025 → 08/31/2027

## Primary source

NSF Award Search: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2528393

## Citation

> US National Science Foundation, Award 2528393, SBIR Phase II: Physics-Guided AI Platform for Accelerating Extreme Ultraviolet (EUV) Mask Design. Retrieved via AI Analytics 2026-06-08 from https://api.ai-analytics.org/grant/nsf/2528393. Licensed CC0.

---

*[NSF Awards dataset](/datasets/nsf-awards) · CC0 1.0*